concentration germanium mechanism

SPECIAL ISSUE DEVOTED TO THE MEMORY OF ACADEMICIAN A M

The mechanisms of optical losses determining the scattering of light in single-mode fibres with a high germanium-dioxide content in a core are investigated. The coefficients of the Rayleigh scattering in fibres with a high level of doping (a molar concentration of GeO 2 of up to 30 %) are measured for the first time. The investigations of the angular distribution of the intensity of light Get price

Minerals

Sphalerite crystallises in the cubic system (4 3 m), and can incorporate many trace elements (Fe, Cd, Mn, Co, etc.) in its structure.This zinc sulphide may contain germanium as a trace element in concentrations of hundreds to thousands ppm [5,7,8].The substitution mechanisms that lead to the incorporation of germanium in the crystal structure of sphalerite are poorly constrained. Get price

Germanium epitaxy on silicon

Mar 18, 2014Germanium, similar to its group neighbor silicon, is an elemental semiconductor in group IV. The lattice constant of germanium is 0.565 79 nm, 4.18% larger than that of silicon, but it near perfectly matches that of III–V compound semiconductor GaAs. Get price

Influence of Germanium Concentration and Homogeneous

An example of concentration depe ndant diffusion activation energy has been shown by Zangenburg et al., w ho studied the diffusion of Ge in Si1-xGex alloys [Zan01]. Their work showed that the activation energy of Ge diffusion in silicon germanium alloys decreases with increasing Ge content. Get price

Urine

The mechanism by which the medullary osmotic gradient is generated is only partially understood. Between 1940 and 1960, a series of experimental and theoretical studies (6–9) appeared to provide a mechanism for generating this gradient.These studies indicated that a small osmotic pressure difference between the ascending and descending limbs of the loops of Henle, generated by net transport Get price

Low Temperature Photoluminescence Properties of Silicon

In this thesis, three examples of the application of the photoluminescence technique to indirect semiconductors at low temperatures are presented. Chapter 2 deals with the effect of increasing impurity concentrations on the photoluminescence spectrum. We present results for the Si:(B,In) system. As the In concentration is increased, we observe quenching of B luminescence. Get price

Reaction Mechanisms

The reaction mechanism (or reaction path) is the process, or pathway, by which a reaction occurs. A chemical reaction usually occurs in steps, although it may not always be obvious to an observer. The decomposition of ozone, for example, appears to follow a mechanism with two steps: Get price

Intrinsic carrier concentration

Intrinsic carrier concentration. In intrinsic semiconductor, when the valence electrons broke the covalent bond and jumps into the conduction band, two types of charge carriers gets generated. They are free electrons and holes.. The number of electrons per unit volume in the conduction band or the number of holes per unit volume in the valence band is called intrinsic carrier concentration. Get price

Reaction mechanism

Reaction mechanism - Reaction mechanism - Unimolecular: Unimolecular nucleophilic substitution reactions proceed by a two-stage mechanism in which heterolysis precedes reaction with the nucleophile. The following equation is a typical example: in which the symbols are the same as in earlier equations, with the addition of delta plus (δ+) and delta minus (δ−), which indicate partial Get price

Hall Coefficient of Germanium

The Hall coefficient for the Germanium sample was found to be-(1.907+0.071)*10-2 m3/C, study of the mechanism of conduction in semiconductors because both the mobility and concentration of the charge carriers may be measured, as opposed to only the conductivity with conductivity experiments. Get price

Intrinsic carrier concentration

Intrinsic carrier concentration. In intrinsic semiconductor, when the valence electrons broke the covalent bond and jumps into the conduction band, two types of charge carriers gets generated. They are free electrons and holes.. The number of electrons per unit volume in the conduction band or the number of holes per unit volume in the valence band is called intrinsic carrier concentration. Get price

Extrinsic semiconductor

P-type semiconductor. When the trivalent impurity is added to an intrinsic or pure semiconductor (silicon or germanium), then it is said to be an p-type semiconductor. Trivalent impurities such as Boron (B), Gallium (G), Indium(In), Aluminium(Al) etc are called acceptor impurity. Get price

The Hall Eﬀect

wt. The current density J x is the charge density nq times the drift velocity v x.In other words I x = J xwt = nqv xwt .(1) The current I x is caused by the application of an electric ﬁeld along the length of the conductor E x.In the case where the current is directly proportional to the ﬁeld, we say that the material Get price

Germanium

As a semiconductor, germanium allowed the production of a solid state equivalent to the diode. Like most semiconductors, germanium can have impurities added to make it an electron donor - a so-called n-type material - or an electron acceptor, called p-type. By marrying p and n type strips of germanium, the element provided the same diode effect. Get price

Growth of SiGe/Si quantum well structures by atmospheric

samples. The germanium concentration was also de- termined by RBS on the same bulk samples. In all cases, the best fit of the rocking curve revealed a germanium concentration of 18.3%, and that de- viations of more then 0.2 nm of the well and barrier widths were not detected. Similar sets of samples Get price

Modeling of Germanium/Silicon Interdiffusion in Silicon

Modeling of Germanium/Silicon Interdiffusion in Silicon/Silicon Germanium/Silicon reported the effect of Ge concentration and/or strain on the interdiffusivity [8]-[9], [13], but most have simply reported demonstrating the vacancy diffusion mechanism and provided further mathematical modeling. By Get price

Ultra

The carrier concentration measured at 2 K was found to be (1.20 0.06) 10 20 cm −3 with a carrier mobility of around 260 cm 2 /(Vs) at a concentration of 2 10 20 cm −3 (activation efficiency about 60%), and (2.20 0.11) 10 20 cm −3 at a concentration of 4 10 20 cm −3 with a carrier mobility of around 130 cm 2 /(Vs Get price

Etch rates for micromachining processing

Germanium forms an oxide that is soluble in water. Thus, water with a high concentration of dissolved oxygen etches ger-manium. Hydrogen peroxide is a useful etchant for Ge, etching faster at higher temperature. Polygermanium has been used in surface micromachining as a sacial layer in conjunction with a polycrystalline SiGe Get price

Kurt J. Lesker Company

Germanium is a hard and brittle material with a semi-metallic, grayish-white appearance. It has a density of 5.35 g/cc, a melting point of 937C, and a vapor pressure of 10 -4 Torr at 1,167C. It is classified on the periodic table as a metalloid, which means it possesses properties of metals and non-metals. Get price

1. (a) Compare interstitial and vacancy atomic mechanisms

What is the carbon concentration of an iron–carbon alloy for which the fraction of total ferrite is 0.94? Solution This problem asks that we compute the carbon concentration of an iron-carbon alloy for which the fraction of total ferrite is 0.94. Application of the lever rule (of the form of Equation 9.12) yields Wα=0.94= CFe 3C−C 0 ' CFe Get price

ORDERS OF REACTION AND MECHANISMS

Cases where the slow step isn't the first step in the mechanism. This is much more difficult to do and explain. I'm going to start with as simple example as possible. Example 1. Suppose the mechanism for a reaction between A and B looks like this: This time the slow step is the second step. Notice that the first (fast) step is reversible. Get price

Facilitated transport of germanium from acidic medium

optimum condition being pH of 1.5, the germanium concentration of 40 mg/dm 3, the carrier concentration of 1 .18 mol/dm 3, and the sulfuric acid concentration of 400 g/dm 3, a mass transfer model was developed. Based on this model, the transport mechanism, diffusion of species to the feed- Get price

1. (a) Compare interstitial and vacancy atomic mechanisms

What is the carbon concentration of an iron–carbon alloy for which the fraction of total ferrite is 0.94? Solution This problem asks that we compute the carbon concentration of an iron-carbon alloy for which the fraction of total ferrite is 0.94. Application of the lever rule (of the form of Equation 9.12) yields Wα=0.94= CFe 3C−C 0 ' CFe Get price

Formation of Depletion Layer in Diode

The value of potential barrier V B is 0.3 volt for germanium and 0.7 Volts for Silicon. Forward Bias When a P-region of a semiconductor diode is connected with the positive terminal of battery and the N-region with negative terminal of the battery then the PN Junction is said to be forward biased. Get price

Intrinsic semiconductor

Electrons and holes. In an intrinsic semiconductor such as silicon at temperatures above absolute zero, there will be some electrons which are excited across the band gap into the conduction band and which can support charge flowing.When the electron in pure silicon crosses the gap, it leaves behind an electron vacancy or hole in the regular silicon lattice. Get price